Method of cleaning conditioning disk

A conditioner for a chemical mechanical polishing (CMP) pad comprising:

• a bar, one end of which is revolvably installed on a fixed unit;
• a disk holder fastening device installed on another end of the bar;
• a disk holder fixed on the disk holder fastening device;
• and
• a conditioning disk fixed on the disk holder, the conditioning disk having a surface on which abrasive grains for conditioning a polishing pad are formed in regions defined by a size difference of the abrasive grains.

A method of fabricating a conditioning disk for a chemical mechanical polishing (CMP) pad comprising steps of:

• a) forming a first adhesive film on a body surface of the conditioning disk with a first thickness;
• b) attaching abrasive grains to the first adhesive film;
• c) forming a second adhesive film over the first adhesive film with a second thickness;
• d) removing incompletely-attached abrasive grains on the adhesive films;
• and
• e) forming a third adhesive film over the second adhesive film with a third thickness.

A method of reworking a conditioning disk for a chemical mechanical polishing (CMP) pad comprising steps of:

• a) immersing the conditioning disk which has been used in a CMP process in a chemical in order to dissolve adhesive film and remove abrasive grains attached on a body surface of the conditioning disk;
• b) cleaning the body surface of the conditioning disk;
• c) forming a first adhesive film with a first thickness on the body surface of the conditioning disk;
• d) attaching abrasive grains to the first adhesive film;
• e) forming a second adhesive film with a second thickness over the first adhesive film;
• f) removing incompletely-attached abrasive grains on the first and the second adhesive films;
• and
• g) forming a third adhesive film with a third thickness over the second adhesive film.

A method of cleaning a conditioning disk for a chemical mechanical polishing (CMP) pad comprising steps of:

• a) immersing the conditioning disk which has been used in a CMP process in a chemical in order to remove by-products existing between abrasive grains on a body surface of the conditioning disk;
• b) cleaning the conditioning disk using deionized water;
• and
• c) drying the conditioning disk.