Method for forming thin film heads using a tri-layer anti-reflection coating for photolithographic applications and a structure thereof

A tri-layer bottom anti-reflection coating for minimizing pattern distortion in photolithography, comprising:

• a first dielectric layer of a first thickness formed on a surface;
• an absorption layer of a second thickness formed on the first dielectric layer;
• and
• a second dielectric layer of a third thickness formed on the absorption layer, wherein the absorption layer and first and second dielectric layers are conformal to the surface.

A bottom anti-reflection structure, comprising:

• a conductive layer formed on a surface;
• a first dielectric layer of a first thickness formed the conductive layer;
• an absorption layer of a second thickness formed on the first dielectric layer;
• a second dielectric layer of a third thickness formed the absorption, wherein the absorption layer and the first and second dielectric layers are conformal to the surface;
• and
• a photoresist layer formed on the second dielectric layer, wherein light is fully absorbed between the surface and the photoresist layer.

A thin film magnetic head formed by a method comprising:

• forming a first dielectric layer on a surface;
• forming an absorption layer on the first dielectric layer;
• and
• forming a second dielectric layer on the absorption, wherein the absorption layer and the first and second dielectric layers are conformal to the surface.

A storage device, comprising:

• at least one data storage medium mounted for simultaneous rotation about an axis;
• at least one magnetic head mounted on an actuator assembly for reading and writing data on the at least one data storage medium;
• and
• an actuator motor for moving the at least one magnetic head relative to the at least one data storage medium;
• and
• wherein the head is formed using a photoresist process and wherein at least one stage in the photoresist process includes forming a tri-layer anti-reflective coating for minimizing pattern distortion in photolithography, the forming the tri-layer anti-reflective coating comprising:
• forming a first dielectric layer on a surface;
• forming an absorption layer on the first dielectric layer;
• and
• forming a second dielectric layer on the absorption, wherein the absorption layer and the first and second dielectric layers are conformal to the surface.