Vision system
AssigneeApplied Materials, Inc.
InventorsIraj Sadighi, Jeff Hudgens, Michael Rice, Gary Wyka
Life of this patent
Estimating the term…
Abstract
A vision system and method for calibrating motion of a robot disposed in a processing system is provided. In one embodiment, a vision system for a processing system includes a camera and a calibration wafer that are positioned in a processing system. The camera is positioned on the robot and is adapted to obtain image data of the calibration wafer disposed in a predefined location within the processing system. The image data is utilized to calibrate the robots motion.
Claims36
A vision system for a semiconductor processing system, comprising:
- at least one robot adapted for use in a semiconductor processing system;
- a calibration wafer supported in the processing system;
- an end effector coupled to the robot;
- a camera selectively positioned by the robot;
- a transmitter coupled to the camera;
- and
- a receiver for receiving images of the calibration wafer transmitted by the camera.
A method for calibrating motion of a robot disposed in a semiconductor processing system, the method comprising:
- positioning a calibration wafer in a semiconductor processing system;
- positioning a camera on a robot;
- viewing the calibration wafer with the camera;
- and
- determining a relative distance between an image of the calibration wafer and a predefined position.
A method for calibrating motion of a robot disposed in a semiconductor processing system, the method comprising:
- moving a calibration wafer supported by a robot to a reference position within a semiconductor processing system;
- viewing the calibration wafer to obtain wafer position data;
- and
- utilizing the wafer position data to correct the reference position.
A method for calibrating motion of a robot disposed in a semiconductor processing system, the method comprising:
- moving a camera disposed on a robot to a predefined position within a semiconductor processing system;
- capturing one or more images of a substrate support with the camera;
- determining a reference motion to be utilized by the robot to transfer a substrate to the substrate support from the captured images;
- transferring a wafer to the substrate support using the reference motion;
- viewing the wafer disposed on the substrate support with the camera;
- capturing one or more images of a wafer with the camera;
- and
- determining a corrected reference motion to be utilized by the robot to place the substrate on the substrate support in a predetermined position.
A method for calibrating motion of a robot disposed in a semiconductor processing system, the method comprising:
- positioning a wafer in a semiconductor processing system utilizing a stored robotic motion routine;
- viewing the wafer with a camera;
- and
- updating the stored robotic motion routine utilizing image data of the wafer.
Dependencies are inferred from the claim text.