Seal device and method for operating the same and substrate processing apparatus comprising a vacuum chamber

A substrate processing apparatus comprising:

• a first vacuum chamber in which a stage device is provided and a substrate loaded on said stage device is processed;
• and
• a second vacuum chamber provided separately from said first vacuum chamber, a drive element for driving said stage device being provided in said second vacuum chamber,
• wherein a pressure P1 in said first vacuum chamber and a pressure P2 in said second vacuum chamber are controlled so as to maintain a relationship PI >P2.

A substrate processing apparatus comprising:

• a first chamber in which a stage device is provided and a substrate loaded on said stage device is processed;
• and
• a second chamber provided separately from said first chamber, a drive element for driving said stage device being provided in said second chamber,
• said first chamber being maintained in a vacuum and a non-contacting seal device being provided between said first chamber and said second chamber,
• wherein said second chamber is capable of being selectively connected to a supply source of dry gas, and a pressure in said second chamber is controlled to be equal to or approximate to atmospheric pressure by supplying and discharging the dry gas.

A substrate processing apparatus comprising:

• a first chamber in which a stage device is provided and a substrate loaded on said stage device is processed;
• and
• a second chamber provided separately from said first chamber, a drive element for driving said stage device being provided in said second chamber,
• said first chamber being maintained in a vacuum and a non-contacting seal device being provided between said first chamber and said second chamber,
• wherein said second chamber is capable of being selectively connected to a supply source of dry gas, and wherein when said non-contacting seal device is operated while said stage device is being driven, a pressure in said second chamber is controlled to be equal to or approximate to atmospheric pressure by supplying and discharging the dry gas, and when said non-contacting seal device is not operated, said second chamber is disconnected from said supply source of dry gas, and discharge of the gas from said second chamber is stopped.

A substrate processing apparatus comprising:

• a first chamber in which a stage device is provided and a substrate loaded on said stage device is processed;
• and
• a second chamber provided separately from said first chamber, a drive element for driving said stage device being provided in said second chamber,
• said first chamber being maintained in a vacuum and a differential vacuum seal device comprising a plurality of vacuum grooves being provided between said first chamber and said second chamber,
• wherein of said plurality of vacuum grooves of said differential vacuum seal device, the vacuum groove which is located closest to said first chamber has an internal pressure lower than or equal to a pressure in said first chamber.