Method and system for ion beam containment in an ion beam guide
AssigneeAxceliss Technologies, Inc
InventorsJohn Zheng Ye, Victor M. Benveniste, Michael Paul Cristoforo
Life of this patent
Estimating the term…
Abstract
Ion implantation systems and beamline assemblies therefor are provided, in which multi-cusped magnetic fields are provided in a beamguide and the beamguide is energized to provide microwave electric fields in a traveling wave along the beamguide passageway. The magnetic and electric fields interact to provide an electron-cyclotron resonance condition for beam containment in the beamguide passageway.
Claims36
An ion implantation system, comprising:
- an ion source adapted to produce an ion beam along a path;
- a beamline assembly located downstream from the ion source, the beamline assembly comprising:
- a beamguide having at least one wall defining a passageway through which the ion beam is transported along the path;
- a magnetic device adapted to provide multi-cusped magnetic fields in the beamguide passageway;
- and
- a power source coupled with the beamguide to provide microwave electric fields in the beamguide passageway, wherein the microwave electric fields and the multi-cusped magnetic fields provide containment of the ion beam in the beamguide passageway;
- and
- an end station located downstream from the beamline assembly along the path, the end station being adapted to support a wafer along the path for implantation using the ion beam.
The ion implantation system of claim 7, wherein the beamguide operates as a waveguide to support the microwave electric fields in the beamguide passageway.
A beamline assembly for transporting an ion beam from an ion source to an end station in an ion implantation system, the beamline assembly comprising:
- a beamguide having at least one wall defining a passageway through which the ion beam is transported along the path;
- a magnetic device adapted to provide multi-cusped magnetic fields in the beamguide passageway;
- and
- a power source coupled with the beamguide to provide microwave electric fields in the beamguide passageway, wherein the microwave electric fields and the multi-cusped magnetic fields provide containment of the ion beam in the beamguide passageway.
A method of providing ion beam containment in an ion implantation system, comprising:
- providing an ion beam along a longitudinal path from an ion source to an end station;
- providing a multi-cusped magnetic field in at a beamguide passageway between the ion source and the end station;
- and
- providing a traveling wave along the beamguide, wherein microwave electric fields of the traveling wave and the multi-cusped magnetic field cooperate to provide ion beam containment along at least a portion of the beamguide passageway.
Dependencies are inferred from the claim text.