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US 2003/0201397 A1Published application
Method and apparatus for simultaneously depositing and observing materials on a target
AssigneeCoincident Beams Licensing Corporation
InventorMichael Mauck
Life of this patent
Estimating the term…
Abstract
A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the first and second beams, into a third beam directed along a third axis.
Claims146
A method for joining at least two beams of charged particles, comprising:
- (a) directing a first beam along a first axis into a field;
- (b) directing a second beam along a second axis into said field;
- and
- (c) turning said first and second beams, by interaction between said field and said first and second beams, into a third beam directed along a third axis.
1 more element
A method for separating at least two beams of charged particles, comprising:
- (a) directing a first beam along a first axis into a field where said first beam includes mixed charged particles;
- (b) focusing said first beam at said field;
- (c) separating said mixed charged particles into at least a second beam and a third beam, by interaction between said field and said first beam.
A method for turning at least two beams of charged particles, comprising:
- (a) directing a first beam along a first axis into a field where said first beam exits said field along a second axis;
- and
- (b) directing a second beam along a third axis into said field where said second beam exists said field along a fourth axis, said third axis is at least one of colinear and coaxial with said second axis and said second beam along said third axis has a different direction of travel than said first beam along said second axis.
An apparatus that joins at least two beams of charged particles, comprising:
- (a) a field;
- (b) a first beam directed along a first axis into said field;
- (c) a second beam directed along a second axis into said field;
- and
- (d) whereby said first and second beams are combined, by interaction between said field and said first and second beams, into a third beam directed along a third axis.
2 more elements
An apparatus to separate at least two beams of charged particles, comprising:
- (a) a field;
- (b) a first beam directed along a first axis into and focused at said field where said first beam includes mixed charged particles;
- and
- (c) a second beam and a third beam provided, by interaction between said magnetic field and said first beam, from said first beam of mixed charged particles.
1 more element
An apparatus that turns at least two beams of charged particles, comprising:
- (a) a first beam directed along a first axis into a field where said first beam exits said field along a second axis;
- and
- (b) a second beam directed along a third axis into said field where said second beam exists said field along a fourth axis, said third axis is at least one of colinear and coaxial with said second axis and said second beam along said third axis has a different direction of travel than said first beam along said second axis.
The method of focusing at least two beams comprising:
- (a) providing a first beam and a second beam that are coaxial with one another where the charge of said first beam is opposite from the charge of said second beam;
- and
- (b) passing said first beam and said second beam through a lens such that said first beam and said second beam are focused at the same plane.
An apparatus that focuses at least two beams comprising:
- (a) a first beam and a second beam that are coaxial with one another where the charge of said first beam is opposite from the charge of said second beam directed toward a lens;
- and
- (b) said lens focusing said first beam and said second beam such that said first beam and said second beam are focused at the same plane.
A method of reducing aberrations in a beam of charged particles comprising the steps of:
- (a) directing said beam along a first axis to a field where said beam leaves said field along a second axis that is not colinear with said first axis;
- (b) directing said second axis toward a mirror;
- (c) reflecting said beam from said mirror along a third axis;
- and
- (c) directing said beam along said third axis to said field where said beam leaves said field along a fourth axis that is not colinear with said first axis.
2 more elements
An apparatus that reduces aberrations in a beam of charged particles comprising:
- (a) said beam directed along a first axis to a field where said beam leaves said field along a second axis that is not colinear with said first axis;
- (b) said second axis directed toward a mirror;
- (c) said beam directed from said mirror along a third axis;
- and
- (c) said beam directed along said third axis to said field where said beam leaves said field along a fourth axis that is not colinear with said first axis.
2 more elements
A method for depositing particles on a target and monitoring said depositing, comprising:
- (a) providing a first beam of ions;
- (b) providing a second beam of electrons;
- (c) combining said first beam and said second beam into a coaxial third beam by interaction between said field and said first and second beams;
- (d) depositing said ions of said third beam on said target;
- and
- (e) monitoring said depositing of step (d) with particles emanating from said target.
3 more elements
A method of depositing at least one ionized atom on a target and moving said at least one atom into a desired position, comprising:
- (a) providing said at least one ionized atom from a first source;
- (b) directing said at least one ionized atom to a field along a first axis;
- (c) directing said at least one ionized atom toward said target along a second axis different from said first axis by interaction of said at least one ionized atom and said field;
- (d) providing at least one electron from a second source;
- (e) directing said at least one electron to said field along a third axis;
- (f) directing said at least one electron toward said target along a fourth axis by interaction of said at least one electron and said field;
- (g) depositing said at least one ionized atom on said target;
- and
- (h) directing said at least one electron in such a manner as to move said deposited at least one ionized atom on said target to a desired position.
6 more elements
An apparatus comprising:
- (a) a lens focusing a beam of charged particles along a first axis upon a geometric center of a magnetic field;
- (b) a magnetic field turning said beam along a second axis directed toward a mirror;
- (c) said mirror arranged to reflect said beam along said second axis upon the geometric center of said magnetic field;
- and
- (d) said magnetic field turning said beam along a third axis directed toward a lens.
2 more elements
An apparatus comprising:
- (a) a beam of charged particles directed along a first axis toward a first field and focused at said first field;
- (b) said first field directing said beam along a second axis toward a lens where said first axis and said second axis are not colinear;
- (c) said lens focusing directing said beam along a third axis toward a second field and focused at said second field;
- and
- (d) said second field directing said beam along a fourth axis where said third axis and said fourth axis are not colinear.
2 more elements
Dependencies are inferred from the claim text.