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OwnerAlan B. Harker, Jeffrey F. DeNatale +1inventors
InventorsAlan B. Harker, Jeffrey F. DeNatale, Dennis R. Strauss
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A tool for embossing high aspect ratio microstructures is provided, wherein the microstructures provide decreased surface reflection and increased transmission through an optical component. The tool is fabricated by a process that comprises etching columnar pits in a silicon substrate using inductively coupled plasma, followed by reactive ion etching of the columnar pits to create relatively pointed obelisks. The silicon substrate is then preferably rinsed prior to vapor depositing a conductive layer thereon. Finally, a metal is electroformed over the conductive layer to form the embossing tool. The embossing tool is then pressed against an optical coating, for example a polymer sheet, to create microstructures having aspect ratios from 1 to 5.
A tool for embossing high optically active textures in an optical coating, the tool comprising a bulk region and a surface region, the surface region having a structure that is the negative of a structure comprising a plurality of tapered etch features, wherein the etch features are characterized by an aspect ratio, a distance a between etch features at the bottom of the etch feature, and a distance b between etch features at a point higher than the bottom of the etch feature, wherein b is greater than a, and the aspect ratio is greater than 1 and less than 5.
A tool for embossing high aspect ratio microstructures made by a process comprising:
A tool for embossing high aspect ratio microstructures in an optical coating made by a process comprising:
Dependencies are inferred from the claim text.