Apparatus associatable with a deposition chamber to enhance uniformity of properties of material layers formed on semiconductor substrates therein

An apparatus for use with a chamber that includes a heating element and is configured to perform a semiconductor fabrication process, said apparatus comprising:

• a temperature control system configured to communicate with the heating element and to cause uneven heat distribution across a surface of a substrate positioned within the chamber during a time coincident with at least a portion of the semiconductor fabrication process;
• and
• a feedback control system in communication with said temperature control system and at least one temperature sensor, said feedback control system configured to cause the heating element of the chamber to alter a thermal output within the chamber in response to transmission of a signal from said at least one temperature sensor.