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AssigneeInternational Business Machines Corporation
InventorsMark A. Church, Alain Michel Louis Desouches, Richard E. Krebs
Estimating the term…
An in-situ (result-directed/predictive) MR stripe height calibration method capable of operating on the fly during lapping operation. The method involves utilization of an interval sampling technique, which provides a high number of data points. The data provided are filtered and averaged at each kerf location to provide a much higher calibration accuracy than previously available. The primary advantage is to create an accurate relationship between MR element resistance and its stripe height while the M element is being lapped. The method thus provides the ability to target either resistance or stripe height or a combination of both during the lapping process. Finally, the system is completely self-contained and does not required wafer data.
A method for enhancing calibration of magneto resistive (MR) elements formed on a wafer during manufacture of said elements, said method comprising:
A lapping control system for performing in-situ calibration of stripe height and resistance characteristics of a deposited thin film resistive material on a wafer, said system comprising:
A method for lapping a plurality of batch fabricated thin film magnetic transducers formed in a row on a substrate, each of said transducer comprising a magneto resistive (MR) element having a height defining edge and exhibiting a corresponding resistance, said method comprising the steps of:
A method for accurately measuring the resistance and stripe height relationship of a deposited thin film resistive material, deposited in rows on a wafer, with each row separated by a kerf, said method comprising the steps of:
A lapping control system for accurately obtaining a desired characteristic of a plurality of batch fabricated thin film magnetic transducers formed in a row on a substrate comprising:
Dependencies are inferred from the claim text.