Alkyl group VA metal compounds
AssigneeShipley Company, L.L.C.
InventorsDeodatta Vinayak Shenai-Khatkhate, Michael Brendan Power, Artashes Amamchyan
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Abstract
Disclosed are methods of preparing monoalkyl Group VA metal dihalide compounds in high yield and high purity by the reaction of a Group VA metal trihalide with an organo lithium reagent or a compound of the formula RnM1X3-n where R is an alkyl, M1 is a Group IIIA metal, X is a halogen and n is an integer fro 1 to 3. Such monoalkyl Group VA metal dihalide compounds are substantially free of oxygenated impurities, ethereal solvents and metallic impurities.
Claims16
A method of preparing a monoalkyl Group VA metal dihalide compound comprising the step of reacting a Group VA metal trihalide with a reagent selected from the group consisting of an (C1-C10)alkyl lithium compound and a compound of the formula RnM1X3-n wherein each R is (C1-C10)alkyl, M1 is a Group IIIA metal, X is a halogen, and n is an integer from 1 to 3, in an organic solvent free of oxygen substitution.
A method for preparing a monoalkyl Group VA metal dihalide compound comprising the step of reacting a Group VA metal trihalide with a reagent selected from the group consisting of an organo lithium compound and a compound of the formula RnM1X3-n wherein each R is (C1-C10)alkyl, M1 is a Group IIIA metal, X is a halogen and n is an integer from 1 to 3, in the presence of a tertiary amine in an organic solvent free of oxygen substitution.
A method for depositing a film of a Group VA metal on a substrate comprising the steps of:
- a) conveying a monoalkyl Group VA metal dihalide compound in the gaseous phase to a deposition chamber containing the substrate;
- b) decomposing the monoalkyl Group VA metal dihalide compound in the deposition chamber;
- and c) depositing a film of Group VA metal on the substrate.
Dependencies are inferred from the claim text.