Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography

A light-absorbing spin-on glass composition comprising a siloxane polymer and an absorbing ether-like compound comprising two or three fused benzene rings and an oxygen linkage to a silicon-containing species selected from the group consisting of siliconethoxy, silicondiethoxy, and silicontriethoxy.

A method of making an absorbing spin-on-glass composition comprising:

• combining one or more silane reactants selected from the group consisting of alkoxysilanes and halosilanes, one or more incorporatable organic absorbing compounds, wherein at least one organic absorbing compound is an absorbing ether compound comprising two or three fused benzene rings and an oxygen linkage to a silicon-containing species selected from the group consisting of siliconethoxy, silicondiethoxy, and silicontriethoxy, an acid/water mixture, and one or more solvents to form a reaction mixture;
• and
• holding the reaction mixture at a temperature between about 30 and about 80° C. for a time sufficient to form the absorbing spin-on-glass composition.