Composition of a resist stripper using electrolytic material with high equivalent conductivity in an aqueous solution
AssigneeDuksung Co., Ltd.
InventorsHo Sung Choi, Ji Hong Kim, Tae Gewn Kim, Sang Hyeuk Yeo, Hae Sung Park
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Abstract
Disclosed is a composition of resist stripper, which is advantageous in light of excellent strippability for residual resists after etching and ashing processes, and superior corrosion resistance to a metal film or a substrate formed with an inorganic material film. The stripping composition comprises 0.5-25 wt % of an electrolytic material having an equivalent conductivity of 300 Ω−1cm2equiv−1 or higher in 0.001 N aqueous solution at 18° C., 60.0-99.4 wt % of water and 0.1-25.0 wt % of a corrosion inhibitor.
Claims3
A composition of resist stripper, comprising 0.5-25 wt % of an electrolytic material having an equivalent conductivity of 300 Ω−1cm2equiv−1 or higher in 0.001 N aqueous solution at 18° C., 60.0-99.4 wt % of water and 0.1-25.0 wt % of a corrosion inhibitor.
Dependencies are inferred from the claim text.