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US 2003/0199162 A1Published application
System and methods for fabrication of a thin pattern
AssigneeSeiko Epson Corporation
InventorShunichi Seki
Life of this patent
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Abstract
The present invention provides a method for fabricating a thin film pattern including forming a pattern made of an organic molecule film on a substrate. The method further includes supplying a solution for forming a thin film onto the organic molecule film pattern, and selectively forming the thin film on the organic molecule film pattern.
Claims8
A microstructure, comprising:
- a substrate;
- an organic molecule film pattern formed on said substrate;
- and
- a thin film pattern having a pattern based on said organic molecule film pattern.
1 more element
An electronic device, comprising:
- a substrate;
- an organic molecule film pattern formed on said substrate;
- and
- a thin film pattern having a pattern based on said organic molecule film pattern.
1 more element
Dependencies are inferred from the claim text.