Mask, method of manufacturing a mask, method of manufacturing an organic electroluminescence device, and organic electroluminescence device
AssigneeSeiko Epson Corporation
InventorsMitsuro Atobe, Shinichi Kamisuki, Ryuichi Kurosawa, Shinichi Yotsuya
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Abstract
A mask is disclosed for use in forming a thin-layer pattern of an organic electroluminescence element having high-precision pixels. The mask is manufactured by wet-etching a (100) silicon wafer (single crystal silicon substrate) 1 in a crystal orientation-dependent anisotropic fashion so as to form through-holes 11 having (111)-oriented walls 11a serving as apertures corresponding to a thin-layer pattern to be formed.
Claims1
A mask for use in manufacturing a thin-layer pattern serving as a layer of an organic electroluminescence element by means of vacuum evaporation, the mask having an aperture corresponding to the thin-layer pattern, the mask being formed of single crystal silicon and having a through-hole serving as the aperture formed by means of anisotropic wet etching using a crystal orientation dependence.
Dependencies are inferred from the claim text.