Substrate measuring method and device
AssigneeCanon Kabushiki Kaisha
InventorsTomohiro Suzuki, Tadashi Okamoto, Kazuhiro Matsumoto, Nobuko Yamamoto
Life of this patent
Estimating the term…
Abstract
To provide a method of making measurements for a sample on the measuring surfaces of a substrate which makes it possible to simplify the control and construction of a measuring device, shorten the measuring period, make the measuring conditions constant, and improve the positional accuracy. The method and a device for carrying out the method are characterized in that measurements for the sample is performed by forming a circular orbit of detection areas, where detection is performed with a detector, on the measuring surfaces of the substrate while moving the detection areas relative to the substrate.
Claims24
A method of making measurements for a sample on a measuring surface of a substrate, comprising forming a circular orbit of detection areas on the measuring surface on said substrate by moving said detection areas to be detested with a detector relative to the substrate.
A device for making measurements for a sample on a measuring surface of a substrate, comprising:
- a detector for measuring for a label from the sample;
- means for supporting a substrate having said sample as the subject of measurements on its measuring surface;
- and
- means for forming a circular orbit of detection areas, on said measuring surface of said substrate by moving said detection areas, in which detection is performed with a detector, relative to said substrate.
Dependencies are inferred from the claim text.