Patterning method, patterning apparatus, patterning template, and method for manufacturing the patterning template
AssigneeSeiko Epson Corporation
InventorsSatoshi Nebashi, Takao Nishikawa, Tatsuya Shimoda
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Abstract
A template 1 is brought close to or in contact with a surface to be patterned 111 and patterns are formed with liquid 62 on the surface 111. This method comprises the steps of: bringing the template 1 close to or essentially in contact with the surface 111, supplying liquid 62 to a plurality of through holes 12 established in the pattern transfer region 10 of the template 1 for supplying the liquid 62, and separating the template 1 from the surface 111 after the liquid 62 is adhered to the surface 111 via the through holes 12.
Claims1
A method for manufacturing a patterning template to adhere liquid to a surface to be patterned and form patterns comprising the steps of:
- forming a resist layer on a base;
- exposing portions of said resist layer according to a pattern;
- developing said exposed resist layer;
- etching the base whereon said developed resist layer is established;
- coating the etched base with porous material;
- curing said porous material applied;
- removing said cured porous material from said base;
- and
- forming a plurality of through holes in said removed porous material to form a template.
Dependencies are inferred from the claim text.