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AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKoji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho, Takeru Watanabe, Matsuo Nakashima, Seiichiro Tachibana, Jun Hatakeyama
Estimating the term…
An ester compound of the following formula (1) is provided. 1 R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is C1-C15 alkyl, k is 0 or 1, Z is a divalent C2-C20 hydrocarbon group which forms a single ring or bridged ring with the carbon atom and which may contain a hetero atom, m is 0 or 1, n is 0, 1, 2 or 3, and 2m+n=2 or 3. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and is suited for micropatterning using electron-beams or deep-UV.
An ester compound of the following general formula (1):
A polymer comprising recurring units of the following general formula (1a-1) and/or (1a-2) derived from an ester compound of the general formula (1), and having a weight average molecular weight of 1,000 to 500,000,
A method for preparing a polymer comprising the step of effecting radical polymerization, anionic polymerization or coordination polymerization between an ester compound of the general formula (1) and another compound having a carbon-to-carbon double bond.
Dependencies are inferred from the claim text.
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Esters of carboxylic acids; Esters of carbonic or haloformic acids: esters of alcohols having the esterified hydroxy group bound to a carbon atom…
Monocarboxylic acid esters having only one carbon-to-carbon double bond: acrylic acid esters; Methacrylic acid esters
Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring: of…
With acrylic or methacrylic acids: c10or C11-acrylate, e.g. isodecyl acrylate, isobornyl acrylate or 2-naphthyl acrylate
Term end not estimated
1. Field of the Invention
The present invention relates to (1) a novel ester compound, (2) a polymer comprising units of the ester compound which is blended as a base resin to formulate a resist composition having a high sensitivity, resolution and etching resistance, and in particular, suitable as micropatterning material for VLSI fabrication, (3) a method for preparing the polymer, (4) a resist composition comprising the polymer, and (5) a patterning process using the resist composition.
2. Prior Art
The only FIGURE, FIG. 1 is a diagram showing the 1H-NMR spectrum of the monomer obtained in Synthesis Example 1.
Ester Compound
The novel ester compounds according to the first aspect of the invention are of the following general formula (1). 7
Herein, R1 is hydrogen, methyl or CH2CO2R3. R2 is hydrogen, methyl or CO2R3. R3 stands for straight, branched or cyclic alkyl groups of 1 to 15 carbon atoms, such as, for example, methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, tert-amyl, n-pentyl, n-hexyl, cyclopentyl, cyclohexyl, ethylcyclopentyl, butylcyclopentyl, ethylcyclohexyl, butylcyclbhexyl, adamantyl, ethyladamantyl and butyladamantyl.