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AssigneeUlvac, Inc.
InventorsHiroto Uchida, Takehito Jinbo, Takeshi Masuda, Masahiko Kajinuma, Takakazu Yamada, Masaki Uematsu, Koukou Suu, Isao Kimura
Estimating the term…
Film-forming apparatus including a film-forming vacuum chamber having a stage for a substrate, a chamber for mixing gas comprising a raw gas and a reactive gas connected to the film-forming chamber, a chamber for vaporizing the raw material, and a gas head for introducing the mixed gas into the film-forming chamber, disposed on the upper face of the film-forming chamber and opposed to the stage. Particle traps with controllable temperatures are positioned between the vaporization chamber and the mixing chamber and on the downstream side of the mixing chamber. When forming a thin film with the apparatus, a reactive gas and/or a carrier gas are passed through the film-forming chamber while opening a valve in a by-pass line, connecting the primary side to the secondary side of the particle trap arranged at the downstream side of the mixing chamber. The valve is then closed and the film-forming operation is initiated.
A film-forming apparatus, which comprises a film-forming chamber as a vacuum chamber equipped with a stage for placing and supporting a substrate in an interior thereof, a mixing chamber for forming a mixed gas comprising a raw gas and a reactive gas and connected to said film-forming chamber, a vaporization chamber for vaporizing a raw material and a gas head for introducing said mixed gas into said film-forming chamber, which is disposed on an upper face of said film-forming chamber and opposed to said stage, in which particle traps whose temperature can be controlled are disposed and positioned between said vaporization chamber and said mixing chamber and on a downstream side of said mixing chamber, respectively.
A method for forming a film using the film-forming apparatus which includes a film-forming chamber as a vacuum chamber equipped with a stage for placing and supporting a substrate in an interior thereof, a mixing chamber for forming a mixed gas comprising a raw gas and a reactive gas and connected to said film-forming chamber, a vaporization chamber for vaporizing a raw material and a gas head for introducing said mixed gas into said film-forming chamber, which is disposed on an upper face of said film-forming chamber and opposed to said stage, in which particle traps whose temperature can be controlled are disposed and positioned between said vaporization chamber and said mixing chamber and on a downstream side of said mixing chamber, respectively;
Dependencies are inferred from the claim text.