6F2 DRAM array with apparatus for stress testing an isolation gate and method
AssigneeMicron Technology, Inc.
InventorDavid D. Siek
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AssigneeMicron Technology, Inc.
InventorDavid D. Siek
Estimating the term…
The present invention includes a 6F2 DRAM array. The DRAM array includes a first memory cell, a second memory cell and an isolation gate formed between the first and second memory cells. The isolation gate is configured to provide electrical isolation between the first and second memory cells. The DRAM also includes a first switch having first and second load electrodes and a control electrode configured to accept a first control signal. The first load electrode is coupled to the isolation gate and the second load electrode is coupled to ground. The DRAM additionally includes a second switch having first and second load electrodes and a control electrode configured to accept a second control signal. The first load electrode is coupled to the isolation gate and the second load electrode is coupled to a stress voltage source.
A 6F2 DRAM array including:
A DRAM array including:
A method of forming memory cells in a 6F2 DRAM array including:
A method of stress testing an isolation gate formed between two rows of memory cells in a DRAM array comprising:
A method of isolating a single row of memory cells in a 6F2 DRAM array comprising:
A computer system comprising:
The computer system of claim 27, wherein the DRAM array further comprises a second transistor having first and second load electrodes and a control electrode configured to accept a second control signal, the first load electrode being coupled to the isolation gate and the second load electrode being configured to be coupled to ground.
The computer system of claim 27, wherein the DRAM array is formed on a semiconductive substrate and the first and second memory cells each comprise an access device and a data storage capacitor, a first load electrode of the access device being coupled to the data storage capacitor via a storage node formed on the substrate, the isolation gate electrically isolating the storage nodes of the first and second cells in response to the second control signal.
The computer system of claim 27, wherein each of the first and second memory cells in the DRAM array has an area of 6F2, wherein F is defined as equal to one-half of minimum pitch, with minimum pitch being defined as equal to the smallest distance of a line width plus a width of a space immediately adjacent said line on one side of said line between said line and a next adjacent line in a repeated pattern within the array.
The computer system of claim 27, wherein the first transistor in the DRAM array is configured to apply a positive voltage to the isolation gate in a test mode of operation.
Dependencies are inferred from the claim text.