Semiconductor storage device
AssigneeOki Electric Industry Co., Ltd.
InventorKoichi Morikawa
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AssigneeOki Electric Industry Co., Ltd.
InventorKoichi Morikawa
Estimating the term…
A semiconductor storage device in the invention comprises a first control transistor which is connected between a bit line and a first node and whose control terminal is connected to a word line, a data retention circuit which includes a first transistor that is connected between the first node and a second reference voltage terminal, as well as a first inverter that includes a second transistor connected between a second node and the second reference voltage terminal, and a substrate potential control circuit which selectively alters a substrate potential of the first transistor so as to make a threshold voltage of the first transistor higher as compared with threshold voltages of the first control transistor and the second transistor. Thus, it is permitted to provide the semiconductor storage device of static type which realizes a reduced layout area and a lower-dissipation-power operation while ensuring the reliability and high operating speed of the write and read of data.
A semiconductor storage device comprising:
A semiconductor storage device comprising:
A semiconductor storage device comprising:
Dependencies are inferred from the claim text.
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Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing, timing or power reduction: for memory cells of the field-effect type
Static stores
Term end not estimated
The present invention relates to a static random access memory (SRAM) which is a semiconductor storage device, and more particularly to a semiconductor storage device of low power dissipation which has a high integration degree and which performs a high-speed operation.
In general, a memory cell in a prior-art SRAM is constructed of bit lines BL and BLb which pair with each other, a data retention circuit which includes a first CMOS inverter that is constituted by a first P-channel type MOS transistor (hereinbelow, termed “PMOS”) connected to a first node N1 and a supply potential Vdd, as well as a first N-channel type MOS transistor (hereinbelow, termed “NMOS”) connected to the first node N1 and a ground potential Vbb, and a second CMOS inverter that is constituted by a second PMOS connected to a second node N2 and the supply potential Vdd, as well as a second NMOS connected to the second node N2 and the ground potential Vbb, that is operated by receiving the output of the first CMOS inverter and that delivers its output as the input of the first CMOS inverter, and a first or second control transistor which is connected to a word line WL and which renders the path between the bit line BL or BLb and the first or second node N1 or N2 electrically conductive or nonconductive.
That is, the memory cell in the prior-art SRAM is constructed of the six MOS (Metal Oxide Semiconductor) transistors.
While the specification concludes with claims particularly pointing out and distinctly claiming the subject matter which is regarded as the invention, it is believed that the invention, the objects, features and advantages thereof will be better understood from the following description taken in connection with the accompanying drawings in which:
FIG. 1 is a circuit diagram showing a semiconductor storage device in a first embodiment of the invention;
FIG. 2 is a circuit diagram showing a practicable example of a substrate potential control circuit in the first embodiment of the invention;
Now, the first embodiment of the invention will be described in detail with reference to the drawings.
FIG. 1 is a diagram showing a semiconductor storage device in the first embodiment of the invention, while FIG. 2 is a diagram showing a practicable example of a substrate potential control circuit in this embodiment.
The semiconductor storage device in this embodiment is constructed of pluralities of bit lines and word lines, and a plurality of memory cells which are connected to the intersection points between the bit lines and the word lines. One of the memory cells is concretely shown in FIG. 1.