Electrostatic chuck
AssigneeIbiden Co., Ltd.
InventorsYasuji Hiramatsu, Yasutaka Ito
Life of this patent
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Abstract
One object of the present invention is to provide an electrostatic chuck which allows sufficiently rapid temperature rising/dropping thereof, in case that the diameter of a ceramic substrate is 190 mm or more or especially incase that the diameter of the ceramic substrate is quite large, exceeding 300 mm. The present invention discloses an electrostatic chuck comprising: a ceramic substrate equipped with a temperature controlling means; an electrostatic electrode formed on the ceramic substrate; and a ceramic dielectric film provided on the electrostatic electrode, wherein: the ceramic substrate has a diameter exceeding 190 mm and a thickness of 20 mm or less; and the ceramic dielectric film contains oxygen in an amount of 0.1 to 20 weight %.
Claims6
An electrostatic chuck comprising:
- a ceramic substrate equipped with a temperature controlling means;
- an electrostatic electrode formed on said ceramic substrate;
- and
- a ceramic dielectric film provided on said electrostatic electrode,
- wherein:
- said ceramic substrate has a diameter exceeding 190 mm and a thickness of 20 mm or less;
- and
- said ceramic dielectric film contains oxygen in an amount of 0.1 to 20 weight %.
An electrostatic chuck comprising:
- a ceramic substrate equipped with a temperature controlling means;
- an electrostatic electrode formed on said ceramic substrate;
- and
- a ceramic dielectric film provided on said electrostatic electrode,
- wherein said ceramic substrate has a diameter exceeding 300 mm and a thickness of 20 mm or less.
Dependencies are inferred from the claim text.