Objective lens
AssigneeOlympus Corporation
InventorKiyonobu Kurata
Life of this patent
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AssigneeOlympus Corporation
InventorKiyonobu Kurata
Estimating the term…
An objective lens includes a first lens group, a second lens group having a lens pair, a third lens group having a lens pair, a fourth lens group having a lens pair, a fifth lens group having a lens pair, and a sixth lens group. The objective lens is configured so as to satisfy the following conditional expressions: d/L<0.025 0.58<Rp/Rn<1.65 where L(mm) is the overall length of the objective lens; d(mm) is the air gap of each of the lens pair; Rp is the radius of curvature of each of positive refractive power surfaces opposing each other with the air gap therebetween; and Rn is the radius of curvature of a negative refractive power surface. Whereby, chromatic aberration can be corrected and resolution is exponentially improved without using a cemented lens, providing a deep ultra-violet objective lens with a high NA capable of auto focussing instantaneously.
An objective lens having an NA of at least 0.7 and being constituted by combining a plurality of single lenses as a whole, the objective lens comprising:
An objective lens having an NA of at least 0.7 and being constituted by combining a plurality of single lenses as a whole, the objective lens comprising:
An optical apparatus comprising:
Dependencies are inferred from the claim text.
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For use with infrared or ultraviolet radiation: for use with ultraviolet radiation
Microscopes: objectives
Microscopes: adapted for ultraviolet illumination ; Fluorescence microscopes
Optical elements, systems or apparatus
Term end not estimated
1. Field of the Invention
The present invention relates to objective lenses, and in particular relates to an objective lens used in a deep ultraviolet-wavelength region around a wavelength of 250 nm for a high-NA (numerical aperture), high-power, and infinity-correction type microscope.
2. Description of the Related Art
FIG. 1 is a schematic structural drawing showing an optical path relating to AF of a general microscope.
FIG. 2 is a schematic structural drawing of an objective lens according to a first embodiment of the present invention.
FIG. 3(a), FIG. 3(b), and FIG. 3(c) are drawings showing spherical aberration, curvature of field, and distortion of the objective lens according to the first embodiment, respectively.
Embodiments according to the present invention will be described below with reference to FIGS. 2 to 14. According to all the embodiments of the present invention, the focal length of an objective lens is 1.8 mm and a correction wavelength band in a deep ultra-violet region is 248±5 nm, and when combined with an image-formation lens having a focal length of 180 mm, the objective lens has a field number of φ5.5 mm and the magnification becomes 100 times as. The chromatic aberration is corrected in a range of 248±5 nm so as to enable the lens to be used in combination with a KrF excimer laser not reduced in a wavelength band. Also, because an adhesive is not used therein, the lens has a sufficient resistance against a laser with high energy. Furthermore, combining the lens with a band pass filter having a full width at half maximum of about 7 nm also enables a specimen to be observed by illuminating it with a mercury lamp as a preliminary stage of laser irradiation. Also, suppressing the displacement in the image formation in a deep ultra-violet region and infrared region enables the AF to be performed.
In each embodiment, aberration shown in an aberration chart indicates aberration on an object plane when the simple objective lens is inversely followed, and their units are mm and %. As for spherical aberration, a dotted line indicates the aberration employing a wavelength of 248 nm; a dotted chain line indicates that of 243 nm; and a solid line indicates that of 253 nm.
First Embodiment