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AssigneeASML Netherlands B.V.
InventorsHendrikus Herman Marie Cox, Frank Auer, Marc Wilhelmus Maria Van Der Wijst, Bastiaan Stephanus Hendrikus Jansen, Dominicus Jacobus Petrus Adrianus Franken
Estimating the term…
A reaction mass and an actuator are used to reduce unwanted vibrations of an optical element in the projection system of a lithographic projection apparatus. The reaction mass may be mechanically connected only to the optical element or may be compliantly mounted to the projection system frame.
A lithographic projection apparatus, comprising:
A device manufacturing method, comprising:
Dependencies are inferred from the claim text.
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From the US filing history. Foreign family members aren’t listed.
Backward citations are indexed for grants only.
Mask illumination systems: illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
Mask projection systems: projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus: mounting of individual elements, e.g.…
Environment aspects, e.g. pressure of beam-path gas, temperature: vibration, e.g. vibration detection, compensation, suppression or isolation
Term end not estimated
1. Field of the Invention
The present invention relates to a lithographic projection apparatus and a device manufacturing method.
2. Description of the Related Art
Embodiments of the present invention will now be described, by way of example only, with reference to the accompanying schematic drawings in which:
FIG. 1 depicts a lithographic projection apparatus according to a first embodiment of the invention;
FIG. 2 depicts the projection system of the apparatus of FIG. 1 in greater detail;
In the Figures, corresponding reference symbols indicate corresponding parts.
FIG. 1 schematically depicts a lithographic projection apparatus 1 according to an embodiment of the invention. The apparatus 1 includes a base plate BP; a radiation system Ex, IL constructed and arranged to supply a projection beam PB of radiation (e.g. EUV radiation), which in this particular case also comprises a radiation source LA; a first object (mask) table MT provided with a mask holder constructed and arranged to hold a mask MA (e.g. a reticle), and connected to a first positioning device PM that accurately positions the mask with respect to a projection system or lens PL; a second object (substrate) table WT provided with a substrate holder constructed and arranged to hold a substrate W (e.g. a resist-coated silicon wafer), and connected to a second positioning device PW that accurately positions the substrate with respect to the projection system PL. The projection system or lens PL (e.g. a mirror group) is constructed and arranged to image an irradiated portion of the mask MA onto a target portion C (e.g. comprising one or more dies) of the substrate W.
As here depicted, the apparatus is of a reflective type (i.e. has a reflective mask). However, in general, it may also be of a transmissive type, for example with a transmissive mask. Alternatively, the apparatus may employ another kind of patterning device, such as a programmable mirror array of a type as referred to above.