Photomask and method of manufacturing the same

#1. Field of the Invention

#The invention relates to a photomask. More specifically, the invention relates to the structure of a photomask on which a transfer pattern to be used for exposure is formed.

#2. Background Art

#FIG. 1 is a schematic cross-sectional view showing a photomask according to a first embodiment of the invention;

#FIG. 2 is an enlarged schematic cross-sectional view showing an area of the photomask shown in FIG. 1 in which a filter is provided;

#FIGS. 3A and 3B are schematic cross-sectional views of an area of the photomask shown in FIG. 1 in which a pressure regulation film is provided;

#Embodiments of the invention will be described hereinbelow by reference to the accompanying drawings. Throughout the drawings, like or corresponding elements are assigned identical reference numerals, and their repeated explanations are simplified or omitted.

#First Embodiment

#FIG. 1 is a schematic cross-sectional view showing a photomask 100 according to a first embodiment of the invention. FIG. 2 is an enlarged schematic cross-sectional view showing an area of the photomask 100 shown in FIG. 1 in which a filter is provided. FIGS. 3A and 3B are schematic cross-sectional views of an area of the photomask 100 shown in FIG. 1 in which a pressure regulation film is provided. FIG. 3A shows a case where the pressure of internal space of the photomask 100 is high, and FIG. 3B shows a case where the pressure of internal space of the photomask 100 is low.