Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsJohannes Catharinus Hubertus Mulkens, Arno Jan Bleeker
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Abstract
A lithographic apparatus includes a spatial light modulator and a the projection system having a beam splitter constructed and arranged to split the patterned beam into patterned beam fractions and project them onto separate target portions on the substrate.
Drawings
Claims11
A lithographic projection apparatus, comprising:
- a radiation system constructed and arranged to provide a projection beam of radiation;
- a programmable patterning device constructed and arranged to pattern the projection beam according to a desired pattern;
- a substrate table for holding a substrate;
- and
- a projection system for projecting the patterned beam onto a target portion of the substrate, wherein projection system comprises:
- a beam splitting device constructed and arranged to split the patterned beam to form a plurality of patterned beam fractions;
- first projection optics constructed and arranged to project a first patterned beam fraction onto a first target portion of a substrate;
- and
- second projection optics constructed and arranged to project a second patterned beam fraction onto a second target portion of a substrate.
A device manufacturing method, comprising:
- providing a substrate that is at least partially covered by a layer of radiation sensitive material;
- providing a projection beam of radiation using a radiation system;
- using a programmable patterning device to endow the projection beam with a pattern in its cross-section;
- projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material;
- splitting the patterned beam of radiation into a plurality of patterned beam fractions prior to projecting it onto the substrate;
- and
- separately projecting the patterned beam fractions onto separate target portions of a substrate.
Dependencies are inferred from the claim text.