US 2003/0197388 A1 · Robot arm having wafer-scratching prevention function

Abstract

A robot arm having wafer-scratching prevention function is disclosed. A touch control method is used in the robot arm to detect the abnormal situation of scratching a wafer, thereby promptly stopping the motion of robot arm from continuously accessing the wafer, so as to prevent a large amount of wafers from scrapping. The robot arm having wafer-scratching prevention function has an electrically conductive layer and an electrically non-conductive layer, wherein the non-conductive layer is located on one surface of the robot arm contacting a target wafer to be accessed, and the conductive layer is on the other surface opposite to the non-conductive layer. The conductive layer is connected to a circuit to generate a stopping signal for stopping the robot arm from continuously accessing the wafer.

Claims26

Dependent claims

A robot arm having wafer-scratching prevention function, comprising:

a non-conductive layer, located on one surface of said robot arm, wherein said one surface is used for contacting a target wafer;
a conductive layer, located on the other surface of said robot arm, wherein said one surface and said other surface are located on both sides of said robot arm;
and
a circuit, wherein said conductive layer is connected to said circuit with at least one conductive wire, so that when said conductive layer contacts a non-target wafer, at least one charge is generated and passed to said circuit.

1 more element

Dependencies are inferred from the claim text.

Robot arm having wafer-scratching prevention function

Life of this patent

Robot arm having wafer-scratching prevention function

Life of this patent

Abstract

Claims26