Thin film transistor array substrate, manufacturing method thereof, and mask

A manufacturing method for a thin film transistor array substrate, comprising:

• forming a first mask including gate patterns having a gate electrode, a gate line connected to the gate electrode, and a gate pad connected to the gate line on a substrate;
• forming a second mask including a gate insulating pattern at an area that covers the gate patterns and where a source/drain pattern is formed including an area of a thin film transistor, except for a pixel area, a semiconductor pattern having a same pattern as the gate insulating pattern and partially removed at the area of the thin film transistor area and the gate line, and a source/drain pattern on the semiconductor pattern, having a source electrode and a drain electrode of the thin film transistor, a data line connected to the source electrode, and a data pad connected to the data line;
• and
• forming a third mask of a transparent electrode pattern having a pixel electrode formed at the pixel area and connected to the drain electrode, a gate pad protective electrode formed on the gate pad, and a data pad protective electrode formed on the data pad.

A mask, comprising:

• a transparent mask substrate;
• a shielding part formed on the transparent mask substrate for intercepting incident light;
• and
• at least two partial exposure portions formed on the mask substrate, each having different light transmittances.