Electron beam drawing apparatus
AssigneeHitachi High-Technologies Corporation
InventorsMasaki Kurihara, Toshihiko Horiuchi, Yoshimasa Fukushima, Masaki Mizuochi
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Abstract
An electron beam drawing apparatus has a sample chamber having a bottom plate, a side wall, and a top plate. Pillar members are disposed at four corners of the sample chamber and a frame is fixed to the pillar members. A plurality of supporting apparatuses for positioning a column mounted on the top plate to the frame are arranged around the column, thereby suppressing vibration of the column at the time of movement of a stage.
Claims13
An electron beam drawing apparatus having a sample chamber in which a stage to set a sample has been enclosed, a fixed base plate for holding said sample chamber, and a column having therein an electron gun for irradiating an electron beam to said sample, comprising:
- a frame which sets said column onto a top plate in an upper portion of said sample chamber and has leg portions extending from corner portions of said fixed base plate to a center;
- a supporting apparatus held on said frame;
- and
- positioning means for adjusting a gap between said column and said supporting apparatus.
An electron beam drawing apparatus having a stage on which a sample is set and which is moved in the horizontal direction, a sample chamber for enclosing said stage, a fixed base plate for mounting said sample chamber, and a column which is arranged in an upper portion of said sample chamber and has therein an electron gun, an electron lens for shaping and converging an electron beam emitted from said electron gun, and a deflector for deflecting the electron beam, comprising:
- pillar members provided for said fixed base plate;
- a frame which is fixed to said pillar members and arranged around said column;
- and
- a plurality of supporting apparatuses which are fixed to said frame and support said column.
Dependencies are inferred from the claim text.