Multi-beam hybrid solenoid lens electron beam system

An electron beam lithography system for controllably directing a set of electron beams at a workpiece comprising:

• at least one solenoid coil for generating a solenoid field parallel to a system axis;
• an array of electron guns for generating a set of initial electron beams travelling within said solenoid field along beam axes parallel to said system axis;
• a set of beam manipulation subsystems, disposed within said solenoid field and comprising;
• an upper set of electrostatic deflection members in each of said subsystems, for deflecting corresponding ones of said set of electron beams over a set of shaping apertures, thereby forming a corresponding set of shaped beams;
• a set of passive demagnifying lenses, having a fixed demagnification factor, for focusing said corresponding set of shaped beams, reduced in cross section by said demagnification factor;
• and
• a lower set of deflection members for directing said corresponding set of shaped beams on said workpiece.