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AssigneeKabushiki Kaisha Toyota Chuo Kenkyusho
InventorsHirozumi Azuma, Akihiro Takeuchi, Takaaki Matsuoka, Kazuyuki Tachi, Nobuo Kamiya
Estimating the term…
Sputtering particles are deposited immediately after activating a surface of a substrate composed of a carbon-containing material. Accordingly, a process for reforming a surface of a substrate, a substrate with a reformed surface, and an apparatus therefor are provided in which the depositability and adhesiveness of the sputtering particles are improved. A vacuum ultraviolet light is generated by a laser beam. A surface of a substrate composed of a carbon-containing material is exposed to the generated vacuum ultraviolet light. As a result, the surface of the substrate is activated. Simultaneously therewith, a sputtering particles-generating device generates sputtering particles, such as neutral atoms, ions and clusters. The resultant sputtering particles are deposited on the activated surface of the substrate. Since the sputtering particles are deposited immediately after the surface of the substrate is activated, they are adhered firmly on the surface of the substrate.
A process for reforming a surface of a substrate composed of a carbon-containing material, comprising the step of:
An apparatus for reforming a surface of a substrate composed of a carbon-containing material, comprising:
An apparatus for reforming a surface of a substrate composed of a carbon-containing material, comprising:
Dependencies are inferred from the claim text.
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Sputtering: introduction of auxiliary energy into the plasma
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material: pretreatment of the material to be coated
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material: characterised by the process of coating
Vacuum evaporation: by wave energy or particle radiation
Term end not estimated
1. Field of the Invention
The present invention relates to a process for reforming a surface of a substrate composed of a carbon-containing material such as a resinous substrate, process which gives the surface a variety of characteristics such as physical and chemical characteristics. Moreover, it relates to a reformed substrate and an apparatus for the same.
2. Description of the Related Art
A more complete appreciation of the present invention and many of its advantages will be readily obtained as the same becomes better understood by reference to the following detailed description when considered in connection with the accompanying drawings and detailed specification, all of which forms a part of the disclosure:
FIG. 1 is a schematic construction diagram for illustrating an overall construction of a substrate surface reforming apparatus in a First Preferred Embodiment according to the present invention;
FIG. 2a-c are diagrams for schematically illustrating a structure of a resinous-substrate surface, wherein:
Having generally described the present invention, a further understanding can be obtained by reference to the specific preferred embodiments which are provided herein for the purpose of illustration only and not intended to limit the scope of the appended claims.
Hereinafter, preferred embodiments according to the present invention will be described in detail. The respective preferred embodiments embody a process for reforming a surface of a substrate, a reformed substrate and an apparatus for the same according to the present invention.
First of all, a substrate surface reforming apparatus 1 in a First Preferred Embodiment according to the present invention will be described with reference to FIG. 1.