Gutter and splash-guard for protecting a wafer during transfer from a single wafer cleaning chamber and positioning such a wafer in this single wafer chamber

A method, comprising:

• placing a wafer in a single wafer holding bracket;
• positioning a center of the wafer to be offset from an axis of rotation of the single wafer holding bracket;
• rotating the single wafer holding bracket;
• and
• generating a centrifugal force to maintain the wafer in a position during the rotation.

A single wafer wet cleaning apparatus comprising:

• a rotatable single wafer holding bracket;
• a megasonics plate for providing megasonic energy to a wafer held by said holding bracket over said megasonic plate;
• a nozzle for providing liquids or gases to said wafer;
• and
• one or more wafer supports disposed on said single wafer holding bracket;
• wherein one or more wafer support position a center of a wafer to off centered from an axis or rotation of said single wafer holding bracket.

A method for cleaning, rinsing, or drying a wafer in a single wafer apparatus comprising:

• placing a wafer in a single wafer holding bracket;
• positioning a center of said wafer to be offset from an axis or rotation of said single wafer holding bracket;
• rotating said single wafer holding bracket;
• generating a centrical force to maintain said wafer in the position during said rotation;
• providing a liquid or a gas onto said wafer while rotating said wafer;
• and
• providing megasonic energy to said wafer while rotating said wafer and while providing said liquid or gas onto said wafer.