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US 2003/0195270 A1Published application
Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsKenji Ishii, Hitoshi Okazaki, Mitsuteru Kondo, Masaaki Takasuka, Motoharu Takeuchi
Life of this patent
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Abstract
A composition containing 3,3′-thiobis(propane-1,2-dithiol) and one or more enic compounds which composition is photocurable and can give a cured product having a high refractive index and adequate hardness.
Claims26
A photocurable composition containing 3,3′-thiobis(propane-1,2-dithiol) of the formula (1),
- 72
- one or more enic compounds and one or more photoradical polymerization initiators.
A sulfur-containing polyenic compound represented by the formula (15),
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- (wherein a is an integer of 1 or 2, and R1 to R4 are a hydrogen atom or an organic residue having 0 to 20 carbon atoms, provided that at least two of R1 to R4 are an aliphatic group or an aromatic group which has a reactive double bond).
A sulfur-containing polythiol compound represented by the formula (40),
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- (wherein a is an integer of 1 or 2 and R1 to R4 are a hydrogen atom, an aliphatic group, an aromatic group, an alicyclic group or a heterocyclic ring and may have a structure having a thiol group, provided that at least two of R1 to R4 are a hydrogen atom or an aliphatic group having a thiol group, an aromatic group having a thiol group, an alicyclic group having a thiol group or a heterocyclic ring having a thiol group and that all of R1 to R4 are not a hydrogen atom at the same time).
Dependencies are inferred from the claim text.