Compositions for chemical-mechanical planarization of noble-metal-featured substrates, associated methods, and substrates produced by such methods

A composition for polishing a substrate surface having at least one feature thereon comprising a noble metal, a noble metal alloy, a noble metal oxide, or any combination thereof, comprising:

• periodic acid in an amount from about 0.05 to about 0.3 moles/kilogram;
• and
• an abrasive in an amount from about 0.2 to about 6 weight percent.

A method of polishing a substrate surface having at least one feature thereon comprising a noble metal, a noble metal alloy, a noble metal oxide, or any combination thereof, comprising:

• providing a composition, the composition comprising periodic acid and an abrasive in a combined amount sufficient to render the substrate surface substantially planar upon chemical-mechanical polishing thereof;
• and
• chemical-mechanical polishing the substrate surface with the composition.

A method of polishing a substrate surface having at least one feature thereon comprising a noble metal, a noble metal alloy, a noble metal oxide, or any combination thereof, comprising:

• providing a composition, the composition comprising periodic acid in an amount from about 0.05 to about 0.3 moles/kilogram and an abrasive in an amount from about 0.2 to about 6 weight percent;
• and
• chemical-mechanical polishing the substrate surface with the composition.