Method for large-scale fabrication of atomic-scale structures on material surfaces using surface vacancies

A method for forming atomic-scale structures on a surface of a substrate on a large scale, said method comprising the steps of:

• creating a first predetermined amount of surface vacancies on a first select area on the surface of the substrate by removing an amount of atoms on said first select area corresponding to said first predetermined amount;
• creating a second predetermined amount of surface vacancies on at least one other select area on the surface of the substrate by removing a second amount of atoms on said at least one other select area of the surface of the substrate corresponding to said second predetermined amount;
• and,
• depositing atoms of a desired structure material on the surface of the substrate to enable said surface vacancies on said first select area and said at least one other select area, and said atoms of said structure material to interact, said interaction causing said atoms of said structure material to form the atomic-scale structures.

A method for forming a plurality of layers of atomic-scale structures on a surface of a substrate on a large-scale, said method comprising the steps of:

• creating a predetermined amount of first surface vacancies on the surface of the substrate by removing an amount of atoms on the surface of the substrate corresponding to said predetermined amount of first surface vacancies;
• depositing atoms of a first desired structure material on the surface of the substrate to enable said first surface vacancies and said atoms of said first structure material to interact, said interaction causing said atoms of said first structure material to form a first layer of the atomic-scale structures;
• creating a predetermined amount of second surface vacancies on a surface of said first layer by removing an amount of atoms on the surface of said first layer corresponding to said predetermined amount of second surface vacancies;
• and,
• depositing atoms of a second desired structure material on said surface of said first layer to enable said second surface vacancies and said atoms of said second structure material to interact, said interaction causing said atoms of said second structure material to form a second layer of the atomic-scale structures.