Semiconductor device manufacturing method and electronic equipment using same

A method for manufacturing semiconductor devices, comprising the steps of:

• adhering a first support board to a rear surface of a substrate proper which has a plurality of circuit element parts with prescribed functions formed on a circuit forming plane on an obverse surface thereof;
• forming first groove portions, which reach said first support board, in said substrate proper;
• forming holes in said first groove portions by using an insulating material in such a manner that said first support board is exposed from a bottom of each of said holes;
• forming metal wiring patterns which extend from electrode portions formed in said circuit element parts to at least parts of inner walls of said holes;
• removing a prescribed amount of said first support board at the bottom of each of said holes:
• filling a conductive material into said holes to form penetration electrodes in such a manner that said conductive material protrudes from said circuit forming plane;
• forming second groove portions, which reach said first support board, in the peripheral portions of said circuit element parts;
• adhering a second support board to that side of semiconductor substrates divided from said substrate proper on which said circuit forming plane is formed;
• removing said first support board;
• inspecting circuit functions of said circuit element parts by placing test probes into contact with said penetration electrodes;
• and
• removing said second support board thereby to separate said substrate proper and said circuit element parts into a plurality of semiconductor devices.

A method for manufacturing semiconductor devices, comprising the steps of:

• forming holes in a support board;
• filling an electrode material into said holes thereby to form first projection electrodes;
• forming first metal wiring patterns connected with first projection electrodes at prescribed positions of said support board;
• adhering a rear surface of a substrate proper, which has a plurality of circuit element parts with prescribed functions formed on a circuit forming plane on an obverse surface thereof, to said support board by using a binding material;
• forming first groove portions, which reach an insulating layer formed of said binding material before said first metal wiring patterns, in areas of said substrate proper between adjacent ones of said circuit element parts;
• forming an insulating film on surfaces of said semiconductor substrates except for electrode portions of said circuit element parts by the use of an insulating material, and forming holes, which reach said support board, in said first groove portions;
• forming second metal wiring patterns which extend from said electrode portions to at least parts of inner walls of said holes;
• removing said insulating layer at a bottom of each of said holes to expose said first metal wiring patterns;
• filling a metal into said holes to form penetration electrodes;
• forming second projection electrodes at prescribed locations of said second metal wiring patterns;
• forming second groove portions, which reach said support board, along said first groove portions thereby to divide said substrate proper into a plurality of semiconductor substrates;
• and
• removing said support board.

A method for manufacturing semiconductor devices with penetration electrodes penetrating through a substrate proper, said method comprising the steps of:

• grinding a rear surface of said substrate proper, which has circuit element parts with prescribed functions formed on a circuit forming plane on an obverse surface thereof, up to a prescribed thickness;
• connecting the ground rear surface of said substrate proper to an insulating film of a support board, said insulating film being formed on an intermediate layer that is in turn formed on a surface of a support board base member;
• forming holes which extend from said circuit forming plane to said support board base member, and forming a penetrating insulating film on an inner side wall of each of said holes;
• filling a conductive material into said holes thereby to form said penetration electrodes, grinding said support board base member until said intermediate layer is exposed, whereby one end of each of said penetration electrodes is protruded;
• and
• removing said intermediate layer by etching to expose said insulating film.

A method for manufacturing semiconductor devices with penetration electrodes penetrating through a substrate proper, said method comprising the steps of:

• removing a rear surface of said substrate proper, which has circuit element parts with prescribed functions formed on a circuit forming plane on an obverse surface thereof, up to a prescribed thickness;
• connecting the removed rear surface of said substrate proper to an insulating film of a support board, said insulating film being beforehand formed on a surface of a support board base member;
• forming holes which extend from said circuit forming plane to said support board base member, and forming a penetrating insulating film on an inner side wall of each of said holes;
• filling a conductive material into said holes thereby to form said penetration electrodes;
• and
• removing said support board base member in such a manner that one end of each of said penetration electrodes is protruded, while leaving said insulating film.

A method for manufacturing semiconductor devices with penetration electrodes penetrating through a substrate proper, said method comprising the steps of:

• removing a rear surface of said substrate proper, which has circuit element parts with prescribed functions formed on a circuit forming plane on an obverse surface thereof, up to a prescribed thickness;
• connecting the removed rear surface of said substrate proper to a surface of a support board base member by means of a binding material;
• hardening said binding material to form an insulating film;
• forming holes which extend from said circuit forming plane to said support board base member, and forming a penetrating insulating film on an inner side wall of each of said holes;
• filling a conductive material into said holes thereby to form said penetration electrodes;
• and
• removing said support board base member in such a manner that one end of each of said penetration electrodes is protruded, while leaving said insulating film.

A method for manufacturing semiconductor devices with penetration electrodes penetrating through a substrate proper, said method comprising the steps of:

• removing a rear surface of said substrate proper, which has a buried oxide film that is an insulating film, to a prescribed thickness;
• connecting the removed rear surface of said substrate proper to a surface of a support board base member;
• forming holes which extend from an obverse surface of said substrate proper to said support board base member;
• filling a conductive material into said holes thereby to form said penetration electrodes;
• and
• removing said support board base member in such a manner that one end of each of said penetration electrodes is protruded, while leaving said insulating film.

A method for manufacturing semiconductor devices with penetration electrodes penetrating through a substrate proper, said method comprising the steps of:

• removing a rear surface of said substrate proper, which has a buried oxide film that is an insulating film, to a prescribed thickness;
• forming holes which extend from an obverse surface of said substrate proper past said buried oxide film;
• filling a conductive material into said holes thereby to form said penetration electrodes;
• and
• removing the rear surface of said substrate proper in such a manner that one end of each of said penetration electrodes is protruded and said buried oxide film is exposed.