Method for treating photosensitive lithographic printing plate
AssigneeMitsubishi Chemical Corporation
InventorsEriko Toshimitsu, Hideaki Okamoto
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Abstract
A method for treating a photosensitive lithographic printing plate, which comprises exposing the photosensitive lithographic printing plate to laser light, developing with a developer containing an alkali metal silicate and then carrying out post-exposure treatment, said photosensitive lithographic printing plate being prepared by forming a photopolymerizable photosensitive layer having a film thickness of from 1.2 to 4 g/m2 and further forming a protective layer having a film thickness of from 2 to 8 g/m2 on a support having a centerline average height (Ra) of at least 0.35 μm.
Claims21
A method for treating a photosensitive lithographic printing plate, which comprises exposing the photosensitive lithographic printing plate to laser light, developing with a developer containing an alkali metal silicate and then carrying out post-exposure treatment, said photosensitive lithographic printing plate being prepared by forming a photopolymerizable photosensitive layer having a film thickness of from 1.2 to 4 g/m2 and further forming a protective layer having a film thickness of from 2 to 8 g/m2 on a support having a centerline average height (Ra) of at least 0.35 μm.
A method for treating a photosensitive lithographic printing plate, which comprises exposing the photosensitive lithographic printing plate to laser light, developing and then carrying out post-exposure treatment at a light intensity of at least 20 mW/cm2 on a surface to be exposed at the time of the post-exposure treatment, said photosensitive lithographic printing plate being prepared by forming a photosensitive layer comprising a photopolymerizable composition containing an ethylenic compound, a photopolymerization initiator and a high molecular binder on the surface of a support.
Dependencies are inferred from the claim text.