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US 2003/0194644 A1Published application
Resist compositions and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Yuji Harada, Yoshio Kawai
Life of this patent
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Abstract
A resist composition comprising a blend of a polymer comprising recurring units k and m of formula (1) wherein R1 and R2 each are hydrogen or an acid labile group, 0<k<1, 0<m<1 and 0<k+m≦1, and another polymer comprising recurring units having carboxyl groups whose hydrogen atoms are replaced by acid labile groups as a base resin forms a resist film which is improved in transparency, alkali dissolution contrast and plasma etching resistance. 1
Claims7
A resist composition comprising a polymer (i) comprising recurring units k and m of the following general formula (1):
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- wherein R1 and R2 each are hydrogen or an acid labile group, k and m are numbers in the range:
- 0<k<1, 0<m<1 and 0<k+m≦1, and another polymer (ii) comprising recurring units having carboxyl groups whose hydrogen atoms are replaced by acid labile groups.
Dependencies are inferred from the claim text.