Photosensitive polymers containing adamantylalkyl vinyl ether, and resist compositions including the same
AssigneeSamsung Electronics Co., Ltd.
InventorSang-Jun Choi
Life of this patent
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Abstract
A photosensitive polymer includes a copolymer containing adamantylalkyl vinyl ether, and a resist composition includes the photosensitive polymer. For example, the photosensitive polymer may include a copolymer having a formula: 1 wherein x is an integer between 1 and 4 inclusive, R1 is a hydrogen atom or a methyl group, R2 is an acid-labile C4 to C20 hydrocarbon group, p/(p+q+r)=0.1 to 0.4, q/(p+q+r)=0.1 to 0.5, and r/(p+q+r)=0.1 to 0.4.
Claims44
A photosensitive polymer comprising a copolymer having a formula:
- 10
- wherein x is an integer between 1 and 4 inclusive, R1 is a hydrogen atom or a methyl group, R2 is an acid-labile C4 to C20 hydrocarbon group, p/(p+q+r)=0.1 to 0.4, q/(p+q+r)=0.1 to 0.5, and r/(p+q+r)=0.1 to 0.4.
A photosensitive polymer comprising a copolymer having a formula:
- 11
- wherein x is an integer between 1 and 4 inclusive, R3 is a hydrogen atom, or a hydroxy, carboxyl, halide, nitrile, alkyl, alkoxy, sulfonate or acid-labile C4˜C20 ester group, p/(p+q+s)=0.1˜0.4, q/(p+q+s)=0.3˜0.5, and s/(p+q+s)=0.2˜0.5.
A photosensitive polymer comprising a copolymer having a formula:
- 12
- wherein x is an integer between 1 and 4 inclusive, R1 is a hydrogen atom or a methyl group, R2 is a C4 to C20 hydrocarbon group, R3 is a hydrogen atom, or a hydroxy, carboxyl, halide, nitrile, alkyl, alkoxy, sulfonate or C4 to C20 ester group, at least one of R2 and R3 is an acid-labile group, p/(p+q+r+s)=0.1 to 0.3, q/(p+q+r+s)=0.2 to 0.5, r/(p+q+r+s)=0.1 to 0.4, and s/(p+q+r+s)=0.1 to 0.3.
A resist composition comprising:
- (a) a photosensitive polymer having a formula:
- 13
- wherein x is an integer between 1 and 4 inclusive, R1 is a hydrogen atom or a methyl group, R2 is an acid-labile C4 to C20 hydrocarbon group, p/(p+q+r)=0.1 to 0.4, q/(p+q+r)=0.1 to 0.5, and r/(p+q+r)=0.1 to 0.4;
- and
- (b) a photoacid generator (PAG).
A resist composition comprising:
- (a) a photosensitive polymer comprising a copolymer having a formula:
- 14
- wherein x is an integer between 1 and 4 inclusive, R3 is a hydrogen atom, or a hydroxy, carboxyl, halide, nitrile, alkyl, alkoxy, sulfonate or acid-labile C4 to C20 ester group, p/(p+q+s)=0.1 to 0.4, q/(p+q+s)=0.3 to 0.5, and s/(p+q+s)=0.2 to 0.5;
- and
- (b) a photoacid generator (PAG).
A resist composition comprising:
- (a) a photosensitive polymer comprising a copolymer having a formula:
- 15
- wherein x is an integer between 1 and 4 inclusive, R1 is a hydrogen atom or a methyl group, R2 is a C4 to C20 hydrocarbon group, R3 is a hydrogen atom, or a hydroxy, carboxyl, halide, nitrile, alkyl, alkoxy, sulfonate or C4 to C20 ester group, at least one of R2 and R3 is an acid-labile group, p/(p+q+r+s)=0.1 to 0.3, q/(p+q+r+s)=0.2 to 0.5, r/(p+q+r+s)=0.1 to 0.4, and s/(p+q+r+s)=0.1 to 0.3;
- and
- (b) a photoacid generator (PAG).
Dependencies are inferred from the claim text.