Positive resist composition

A positive resist composition comprising (A) a resin, which is decomposed by the action of an acid to increase solubility in an alkali developing solution, having a repeating unit represented by formula (Y) shown below, (B) a compound capable of generating an acid upon irradiation of an actinic ray or radiation, and (C) a solvent.

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• wherein, R1 to R6, which may be the same or different, each represent a hydrogen atom, a fluorine atom, an alkyl group or a substituted alkyl group in which at least one hydrogen atom is substituted with a fluorine atom, provided that at least one of R1 to R6 is a fluorine atom;
• L represents a hydrogen atom or a group decomposable upon the action of an acid;
• n represents 1 or 2, when n is 2, two R1's to R6's and L's may be the same or different from each other;
• A represents a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group, a cyano group or a trifluoromethyl group;
• and the structural formula (YA) shown below represents a benzene ring structure hydrogenated at least partially.
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