Deposition methods utilizing microwave excitation, and deposition apparatuses
AssigneeMicron Technology, Inc.
InventorsCraig M. Carpenter, Ross S. Dando, Philip H. Campbell
Life of this patent
Estimating the term…
Abstract
The invention includes a deposition apparatus having a reaction chamber, and a microwave source external to the chamber. The microwave source is configured to direct microwave radiation toward the chamber. The chamber includes a window through which microwave radiation from the microwave source can pass into the chamber. The invention also includes deposition methods (such as CVD or ALD methods) in which microwave radiation is utilized to activate at least one component within a reaction chamber during deposition of a material over a substrate within the reaction chamber.
Claims68
A deposition method comprising microwave excitation of a component within a reaction chamber during deposition of a material over a substrate within the reaction chamber;
- the excitation resulting from phased array microwave radiation passing into the reaction chamber.
A deposition method, comprising:
- providing an apparatus comprising a reaction chamber and a microwave source external to the chamber;
- the reaction chamber comprising a window through which microwave radiation can pass;
- passing microwaves from the source, through the window, and into the chamber;
- placing a substrate within the reaction chamber;
- flowing one or more materials within the reaction chamber and through the microwaves;
- and
- depositing at least a component of the one or more materials onto the substrate.
A deposition method, comprising:
- providing an apparatus comprising a reaction chamber and a microwave source external to the chamber;
- the reaction chamber comprising a window through which microwave radiation can pass;
- placing a substrate within the reaction chamber;
- flowing one or more one microwave-inducible constituents into the reaction chamber;
- flowing one or more precursors into the reaction chamber;
- while the substrate and the one or more microwave-inducible constituents are within the reaction chamber, activating at least one of the microwave-inducible constituents with microwave radiation to form at least one activated species;
- depositing at least a component of at least one of the one or more precursors onto the substrate;
- and
- reacting the at least one of the one or more precursors with the activated species, the reacting occurring at one or more of before, after and during the depositing.
A deposition method, comprising:
- providing an apparatus comprising a reaction chamber;
- a microwave source external to the chamber, and an inlet port extending through the microwave source and into the reaction chamber;
- the reaction chamber comprising a window through which microwave radiation can pass, and the inlet port extending through the window and terminating in an opening under the window;
- the apparatus further comprising a gas dispersion plate beneath the opening;
- passing microwaves from the source, through the window, through the dispersion plate, and into the chamber;
- placing a substrate within the reaction chamber and under the dispersion plate;
- flowing one or more materials through the inlet port, across and through the dispersion plate, and into the reaction chamber;
- the one or more materials being subjected to the microwaves while in the reaction chamber;
- and
- depositing at least a component of the one or more materials onto the substrate.
A deposition apparatus, comprising:
- a reaction chamber;
- a microwave source external to the chamber and configured to direct microwave radiation toward the chamber;
- and
- a window in a side of the reaction chamber through which microwave radiation from the microwave source can pass into the chamber.
A deposition apparatus, comprising:
- a reaction chamber comprising a window;
- a microwave source external to the chamber and configured to emit microwave radiation through the window and into the reaction chamber;
- an inlet port extending through the microwave source and into the reaction chamber;
- the inlet port extending through the window and terminating in an opening under the window;
- a gas dispersion plate within the reaction chamber and beneath the opening of the inlet port;
- and
- a substrate holder within the chamber and beneath the gas dispersion plate.
Dependencies are inferred from the claim text.