Trench schottky rectifier
AssigneeGeneral Semiconductor, Inc.
InventorsFwu-luan Hshieh, Koon Chong So
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AssigneeGeneral Semiconductor, Inc.
InventorsFwu-luan Hshieh, Koon Chong So
Estimating the term…
A Schottky rectifier is provided. The Schottky rectifier comprises: (a) a semiconductor region having first and second opposing faces, with the semiconductor region comprising a cathode region of first conductivity type adjacent the first face and a drift region of the first conductivity type adjacent the second face, and with the drift region having a lower net doping concentration than that of the cathode region; (b) one or more trenches extending from the second face into the semiconductor region and defining one or more mesas within the semiconductor region; (c) an insulating region adjacent the semiconductor region in lower portions of the trench; (d) and an anode electrode that is (i) adjacent to and forms a Schottky rectifying contact with the semiconductor at the second face, (ii) adjacent to and forms a Schottky rectifying contact with the semiconductor region within upper portions of the trench and (iii) adjacent to the insulating region within the lower portions of the trench.
A Schottky rectifier, comprising:
A method of forming a trench Schottky rectifier, comprising:
The Schottky rectifier of claim 12 wherein said insulating region comprises silicon dioxide.
Dependencies are inferred from the claim text.