Light-emitting device, liquid-crystal display device and method for manufacturing same

A liquid-crystal display device comprising:

• a first substrate having an insulating surface;
• a second substrate having light transmission property;
• a pixel region having a first electrode, a second electrode and a liquid-crystal material sandwiched between the first and second electrodes;
• and
• a drive circuit having thin-film transistors,
• whereby the pixel region is arranged with a gate line or source line made with a buried interconnection.

A display device comprising:

• a substrate having an insulating surface;
• a first insulating film formed over the substrate;
• a gate line buried in the first insulating film;
• a second insulating film formed over the first insulating film;
• and
• a thin film transistor formed over the second insulating film,
• wherein the gate line is electrically connected to a gate electrode of the thin film transistor.

A display device comprising:

• a substrate having an insulating surface;
• a first insulating film formed over the substrate;
• a source line buried in the first insulating film;
• a second insulating film formed over the first insulating film;
• and
• a thin film transistor formed over the second insulating film,
• wherein the source line is electrically connected to a source region of the thin film transistor.

A display device comprising:

• a substrate having an insulating surface;
• a first insulating film formed over the substrate;
• a power supply line buried in the first insulating film;
• a second insulating film formed over the first insulating film;
• and
• a thin film transistor formed over the second insulating film.

A method for manufacturing a light-emitting device comprising:

• forming an etching-stop layer having an electric conductivity on an insulating surface;
• forming a first insulating film covering the etching-stop layer;
• etching the first insulating film to open an opening reaching the etching-stop layer;
• forming a seed and carrying out plating to form a buried interconnection covering the opening;
• planarizing a surface of the buried interconnection;
• forming a second insulating film containing aluminum;
• forming a third insulating film on the second insulating film;
• forming a semiconductor layer on the third insulating film;
• forming a fourth insulating film on the semiconductor layer;
• forming a gate electrode on the fourth insulating film;
• forming a line connecting to the semiconductor layer and a line connecting the buried interconnection;
• forming a first electrode;
• and
• forming a layer containing organic compound on the first electrode and a second electrode on the layer containing organic compound.

A method for manufacturing a liquid-crystal display device comprising:

• forming an etching-stop layer having an electric conductivity on an insulating surface;
• forming a first insulating film covering the etching-stop layer;
• etching the first insulating film to open an opening reaching the etching-stop layer;
• forming a seed and carrying out plating to form a buried interconnection covering the opening;
• planarizing a surface of the buried interconnection;
• forming a second insulating film containing aluminum;
• forming a third insulating film on the second insulating film;
• forming a semiconductor layer on the third insulating film;
• forming a fourth insulating film on the semiconductor layer;
• forming a gate electrode on the fourth insulating film;
• and
• forming a source line connected to the semiconductor layer and a line connecting between the buried interconnection and the gate line.