US 2003/0193010 A1 · Method and apparatus for early detection of material accretion and peeling in plasma system

Abstract

A method and apparatus for detecting material accretion and peeling in a system such as a plasma process chamber, including multiple optical sensors which are provided in the chamber above a gas distribution plate or other surface inside the chamber. The optical sensors are connected to a central process controller that is capable of terminating operation of the chamber and may be equipped with an alarm. In the event that the optical sensors detect asymmetries in brightness or light reflection among various portions or regions of the gas distribution plate or other surface, which asymmetries may indicate the formation of a material coating on the plate or dislodging of contaminant particles from the plate, a signal is sent to the process controller, which may be adapted to terminate the plasma process, alert operating personnel, or both.

Claims20

Dependent claims

An apparatus for detecting material accretion and peeling in a system, comprising:

a chamber having a chamber interior for containing processing operations and comprising a surface in said chamber interior;
a process controller operably connected to said chamber for terminating said processing operations in said chamber interior;
and
a plurality of optical sensors provided in said chamber and operably connected to said process controller for monitoring relative brightness between various regions of said surface and activating said process controller when said relative brightness varies by at least about 1%.

1 more element

Dependencies are inferred from the claim text.

Method and apparatus for early detection of material accretion and peeling in plasma system

Life of this patent

Method and apparatus for early detection of material accretion and peeling in plasma system

Life of this patent

Abstract

Claims20