US 2003/0192864 A1 · Plasma processing apparatus and method

Abstract

ABSTRACT A plasma processing apparatus having a process chamber to process specimens; a status detecting unit for detecting the internal processing status of the process chamber and outputting a plurality of signals; and a signal converting unit for extracting an arbitrary number of signal processing filters from a signal filter database using a signal filter selector and creating an arbitrary number of device status signals. The signal converting unit creates fewer effective device status signals of a time series from the output signals.

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Claims1

Dependent claims

A plasma processing apparatus, comprising:

a process chamber to contain one or more specimens;
a plasma generator to generate plasma in the process chamber;
a database containing a plurality of signal filters;
a controller arranged to control a status of each device on the specimens and to control process conditions of the specimens;
a status detecting unit arranged to detect the status of each device on the specimens inside of the process chamber;
a signal filter selector arranged to select one or more signal filters from the database according to the process conditions of the specimens;
and
a signal converting unit arranged to create as many device status signals from the status detecting unit as the signal filters selected;
wherein the signal filters can be replaced each time a process condition changes.

6 more elements

Dependencies are inferred from the claim text.

Plasma processing apparatus and method

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