Cleaning ceramic surfaces
AssigneeApplied Materials, Inc.
InventorsHong Shih, Danny Chien Lu, Nianci Han, Xikun Wang, Hui Chen, Hui Tang, Li Xu, Yang Zhang, Dan Wang
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Abstract
Method and apparatus for cleaning ceramic surfaces of parts used, for example, and without limitation, in semiconductor processing equipment. In particular, one embodiment of the present invention is a method for cleaning a ceramic part that includes steps of: (a) treating the surface using one or more first mechanical processes; (b) treating the surface using one or more chemical processes; (c) plasma conditioning the surface; and (d) treating the surface using one or more second mechanical processes.
Claims21
A method for cleaning a part having a ceramic surface which comprises steps of:
- treating the surface using one or more first mechanical processes;
- treating the surface using one or more chemical processes;
- plasma conditioning the surface;
- and
- treating the surface using one or more second mechanical processes.
A method for cleaning a part having a ceramic surface which comprises steps of:
- treating the surface using one or more first mechanical processes;
- treating the surface using one or more chemical processes;
- exposing the surface to H2SO4:H2O2;
- and
- treating the surface using one or more second mechanical processes.
A method for cleaning a part having a ceramic surface which comprises steps of:
- treating the surface using one or more first mechanical processes;
- treating the surface using one or more chemical processes;
- exposing the surface to NMD-3;
- and
- treating the surface using one or more second mechanical processes.
Dependencies are inferred from the claim text.