Back to results
US 2003/0190548 A1Published application
Light-sensitive composition
AssigneeMitsubishi Paper Mills Limited
InventorsAkira Furukawa, Kunihiro Doi
Life of this patent
Estimating the term…
Loading patent…
Loading patent…
AssigneeMitsubishi Paper Mills Limited
InventorsAkira Furukawa, Kunihiro Doi
Estimating the term…
There are disclosed a light-sensitive composition which comprises (A) at least one water-soluble polymer selected from a cationic water-soluble polymer having a phenyl group substituted by a vinyl group at a side chain of the polymer and a water-soluble polymer having a phenyl group substituted by a vinyl group and a sulfonate group at a side chain of the polymer, and (B) at least one of a photopolymerization initiator and a photo-acid generator; and a light-sensitive composition which comprises at least one cationic monomer having two or more polymerizable unsaturated groups in the molecule, at least one polymer, and at least one of a photopolymerizable initiator and a photo-acid generator.
A light-sensitive composition which comprises (A) at least one water-soluble polymer selected from a cationic water-soluble polymer having a phenyl group substituted by a vinyl group at a side chain of the polymer and a water-soluble polymer having a phenyl group substituted by a vinyl group and a sulfonate group at a side chain of the polymer, and (B) at least one of a photopolymerization initiator and a photo-acid generator.
Alight-sensitive composition which comprises at least one cationic monomer having two or more polymerizable unsaturated groups in the molecule, at least one polymer, and at least one of a photopolymerizable initiator and a photo-acid generator.
Dependencies are inferred from the claim text.
From the US filing history. Foreign family members aren’t listed.
Backward citations are indexed for grants only.
Drawings are temporarily unavailable. Open the PDF at USPTO
For lithographic printing; Master sheets for transferring a lithographic image to the forme: by removal or destruction of lithographic material on…
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one…:…
Use of organic ingredients: boron-containing compounds
Photosensitive materials: non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Term end not estimated
1. Field of the invention
This invention relates to a light-sensitive composition which can be used for preparation of a lithographic printing plate, a resist for forming a printed circuit, a color filter and a phosphor pattern, particularly to a light-sensitive composition suitable for a lithographic printing plate. More specifically, it relates to a light-sensitive composition which is capable of forming an image by using a scanning exposure device such as laser, etc. Also, it relates to a lithographic printing plate which is capable of mounting to a printing machine without carrying out development and of printing.
2. Prior art
In the following, the present invention is explained by referring to Examples, but the scope of the present invention is not limited by these Examples as a matter of course.
A coating solution of a light-sensitive composition having the following composition was prepared. Then, the coating solution was coated onto a polyethylene terephthalate film with a thickness of 0.10 mm having a gelatin undercoating layer so that a dried thickness became 2.0 μm and dried to obtain a sample.
1 Water-soluble polymer A (CP-1) 3.0 parts by weight Photopolymerization initiator (PI-1) 1.0 part by weight Basic Blue 7 0.1 part by weight Methanol 50.0 parts by weight 28