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AssigneeKodak Polychrome Graphics LLC
InventorsKevin Barry Ray, Anthony Paul Kitson, Eduard Kottmair, Hans-Horst Glatt, Stefan Hilgart
Estimating the term…
Imageable precursors for masks and for electronic parts comprise a polymeric layer applied to a substrate. The layer comprises at least one polymer having infra-red absorbing groups carried as pendent groups on the polymer backbone. Certain infrared absorbing groups may also act to insolubilize the polymer in a developer, until it is imagewise exposed to infra-red radiation. Imagewise application of heat, resulting from imagewise exposure of the precursor to infra-red radiation, renders the polymer layer more soluble in the developer than prior to exposure to the infra-red radiation.
A method of producing a mask, the method comprising:
A method of producing a mask, the method comprising:
A method of producing a mask, the method comprising:
A mask precursor comprising a substrate and a layer applied to the substrate, wherein the layer comprises a film-forming polymer having at least one pendent infra-red absorbing group, wherein the layer has a first solubility in a developer liquid prior to exposure to infra-red radiation, and a second solubility in the developer liquid after exposure to infra-red radiation, and the second solubility is greater than the first solubility, wherein the layer contains a dissolution inhibition compound admixed with the polymer that inhibits dissolution in the developer liquid prior to exposure of the polymer to infra-red radiation.
A mask precursor comprising a substrate and a layer applied to the substrate, wherein the layer comprises a film-forming polymer having at least one pendent infra-red absorbing group, wherein the layer has a first solubility in a developer liquid prior to exposure to infra-red radiation, and a second solubility in the developer liquid after exposure to infra-red radiation, and the second solubility is greater than the first solubility, wherein the film forming polymer comprises further pendent groups, selected from the group consisting of —O—SO2-tolyl, —O-dansyl, —O—SO2-thienyl, —O—SO2-naphthl, —O—CO—Ph, and combinations thereof, which inhibit the dissolution of the polymer in the developer liquid, prior to exposure of the polymer to infra-red radiation.
A mask precursor comprising a substrate and a layer applied to the substrate, wherein the layer comprises a film-forming polymer having at least one pendent infra-red absorbing group, wherein the layer has a first solubility in a developer liquid prior to exposure to infra-red radiation, and a second solubility in the developer liquid after exposure to infra-red radiation, and the second solubility is greater than the first solubility, wherein the film forming polymer comprises further pendent groups, selected from the group consisting of o-benzoquinonediazide moieties, o-naphthoquinonediazide moieties, and combinations thereof, which inhibit the dissolution of the polymer in the developer liquid, prior to exposure of the polymer to infra-red radiation.
A method of producing an electronic part, the method comprising:
A method of producing an electronic part, the method comprising:
A method of producing an electronic part, the method comprising:
Dependencies are inferred from the claim text.
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Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles…
Quinonediazides: macromolecular quinonediazides; Macromolecular additives, e.g. binders
Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces: characterised by the composition…
Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces: characterised by the exposure…
Term end not estimated
1. Field of the Invention
This invention relates to positive working precursors for masks and electronic parts and to methods of making such precursors using imageable compositions, and to masks and electronic parts made using such precursors. More particularly, this invention is directed to a thermal, positive working precursor for masks and electronic parts, wherein the precursor comprises a substrate having a layer comprising a film forming polymer which has at least one pendent IR-absorbing group, the layer is less soluble in a developer solution prior to exposure to IR radiation, and the layer is more soluble in the developer after exposure to radiation.
2. Background Information
It has been found that a polymer may be manufactured which itself is capable of absorbing infra-red radiation, to generate the heat required to alter its solubility in a developer liquid from a first solubility wherein the polymer is less soluble in a developer liquid to a second solubility wherein the same polymer is more soluble in the developer liquid in comparison with when the polymer has the first solubility. It has been determined that such a polymer may have some useful further properties which could not have been predicted. Such a polymer has pendent infra-red absorbing groups, the polymer having the property that it does not readily dissolve in a developer liquid when it has a first solubility, with the proviso that when subjected to infra-red radiation which is absorbed by the infra-red absorbing groups to produce heat, the same polymer acquires a second solubility replacing the first solubility and the polymer thereby more readily dissolves in the developer liquid. Such a polymer is referred to herein as an “infra-red absorbing polymer.”
An infra-red absorbing polymer may absorb infra-red radiation efficiently and convert it to heat even at a very low loading of the infra-red absorbing species, compared with corresponding admixed compositions. Furthermore there is a blue shift in the maximum absorbency of the infra-red absorbing polymer, as loading of the infra-red species increases. This shift can be harnessed. Dyes which as admixed species could not be used with a given radiation source may now be useful, when carried as part of an infra-red absorbing polymer.
Preferably the parent polymer (that is, the corresponding polymer without any pendent groups) has nucleophilic groups Y, able to react with an infra-red absorbing compound, having a halogen atom, for example a chlorine atom. Preferably the parent polymer has groups Y selected from —SO2NHR, —NHR, —SH and —OH, where R represents a hydrogen atom or a C1-4 alkyl group, for example a methyl group. Preferably R represents a hydrogen atom. More preferably the parent polymer has sulfonamido groups or hydroxyl groups Y, or both.