Quartz glass jig for processing apparatus using plasma
AssigneesHeraeus Quarzglas GmbH & Co. KG, Shin-Etsu Quartz Products Co., Ltd.
InventorsKyoichi Inaki, Naoto Watanabe, Tohru Segawa, Hiroyuki Kimura
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Abstract
An object of the present invention is to provide a quartz glass jig, which, when employed in a processing apparatus using plasma, is less in generation of abnormal etching and particles and low in contamination with impurities. This object is obtained by a quartz glass jig for a processing apparatus using plasma, wherein a surface of the jig is subjected to grinding or a sandblast processing and has a surface roughness Ra in the range of from 2 μm to 0.05 μm, and microcracks of grinding marks formed during the grinding or sandblast processing have a depth of 50 μm or less.
Claims4
A quartz glass jig for a processing apparatus using plasma, characterized in that a surface of the jig is subjected to mechanical processing such that the quartz glass jig has a surface roughness Ra in the range of from 2 μm to 0.05 μm, and microcracks formed during the mechanical processing have a depth of 50 μm or less.
Dependencies are inferred from the claim text.