Magnetic sensor having second antiferromagnetic layers and two types of electrode layers on free magnetic layer and manufacturing method thereof

A method for manufacturing a magnetic sensor, comprising:

• step (a) of forming a multilayer film including a first antiferromagnetic layer, a fixed magnetic layer, a nonmagnetic material layer, and a free magnetic layer provided in that order on a substrate;
• step (b) of forming second antiferromagnetic layers, which are disposed on two side portions of the multilayer film in a track width direction, and first electrode layers on the second antiferromagnetic layers;
• and
• step (c) of forming second electrode layers directly on or indirectly above at least internal end surfaces in the track width direction of the first electrode layers and the second antiferromagnetic layers and parts of the upper surface of the multilayer film, the second electrode layers being provided with a predetermined space provided therebetween in the track width direction.

A method for manufacturing a magnetic sensor, comprising:

• step (a) of forming a multilayer film including a first antiferromagnetic layer, a fixed magnetic layer, a nonmagnetic material layer, and a free magnetic layer provided in that order on a substrate;
• step (b) of forming second antiferromagnetic layers, which are disposed on two side portions of the multilayer film in the track width direction, and first electrode layers on the second antiferromagnetic layers;
• step (d) of forming a solid second electrode film on the upper surfaces of the first electrode layers, internal end surfaces in the track width direction of the first electrode layers and the second antiferromagnetic layers, and the upper surface of the multilayer film;
• and
• step (e) of removing a center part of the solid second electrode film formed on the upper surface of the multilayer film, whereby second electrode layers with a predetermined space provided therebetween in the track width direction are formed on the internal end surfaces and parts of the upper surface of the multilayer film.