Pattern forming method

An exposure apparatus for forming a desired pattern by exposing a sensitive material coated on a substrate, comprising:

• a first optical system for transferring a first pattern by exposing the sensitive material;
• a second optical system for transferring a second pattern by exposing the sensitive material, the desired pattern being expressed as a synthesize pattern consisting of the first and second pattern;
• and
• a controller for adjusting an exposure position of the second pattern, based on a latent image of the first pattern formed in the sensitive material.

A lithography system comprising:

• a coating/developing device for costing a sensitive material on a substrate and for developing the sensitive material in which a desired pattern is transferred by exposure;
• a light stepper for transferring a first pattern by exposing the sensitive material;
• a charge beam exposure device for transferring a second pattern by exposing the sensitive material, the desired pattern being expressed as a synthesize pattern consisting of the first and second patterns;
• an optical system for detecting a latent image of the first pattern formed in the sensitive material exposed by the light stepper;
• and
• a controller for adjusting an exposure position of the second pattern, based on a position of the latent image detected.

A lithography system comprising:

• a coating/developing device for costing a sensitive material on a substrate and for developing the sensitive material in which a desired pattern is transferred by exposure;
• a charge beam exposure device for transferring the desired pattern by exposing the sensitive material;
• an optical system for detecting a surface pattern of the substrate below the sensitive material;
• and
• a controller for adjusting an exposure position of the desired pattern, based on a position of the surface pattern detected.

A pattern inspection apparatus for inspecting a pattern transferred by exposing a sensitive material on a substrate, comprising:

• an irradiation system for irradiating light or a charge beam onto the substrate;
• a detection system for detecting reflection light or secondary electrons from the substrate;
• means for obtaining a latent image of an exposure pattern, based on a signal detected by the detection system;
• and
• means for inspecting the exposure pattern, based on the latent image.